This is a photolithography system that allows a pattern to be written in optically sensitive resist by scanning a laser spot over the surface. This allows larger area contacts and large scale devices to be produced at lower cost than taking valuable time on the electron beam facility. Facility: http://www.graphene.manchester.ac.uk/
| Professor Sir Konstantin Novoselov | |
| Konstantin.Novoselov@manchester.ac.uk | |
| +44-161-275-4119 |
| Professor Sir Konstantin Novoselov | |
| Konstantin.Novoselov@manchester.ac.uk | |
| +44-161-275-4119 |