Description

This is a photolithography system that allows a pattern to be written in optically sensitive resist by scanning a laser spot over the surface. This allows larger area contacts and large scale devices to be produced at lower cost than taking valuable time on the electron beam facility. Facility: http://www.graphene.manchester.ac.uk/

ManufacturerMICROTECH

ModelLW405B standard+

Location

Contact

Academic Contact

Professor Sir Konstantin Novoselov
Konstantin.Novoselov@manchester.ac.uk
+44-161-275-4119

Technical Contact

Professor Sir Konstantin Novoselov
Konstantin.Novoselov@manchester.ac.uk
+44-161-275-4119