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2 x Standalone etch system based on nanoPVD platform
Process Equipment - Physical
Etching
Plasma
Ambient Temperature Probestation
Sample Measurement/Analysis
Optical
Quantum Information
Confocal Raman Microscope System
Materials Characterisation
Spectroscopy
Raman
Cryo-cooled probestation
Sample Measurement/Analysis
Optical
Quantum Information
Deep Reactive Ion Etch Systems (x2 systems)
Process Equipment - Physical
Etching
Plasma
EDS Analysis system
Materials Characterisation
Spectrometry
X-ray
Electron Beam Lithography System
Process Equipment - Physical
Lithography
Electron beam
EVO10 MA Lab6 with High speed blanking
Process Equipment - Physical
Lithography
Electron beam
Femtosecond laser micromachining system
Process Equipment - Physical
Etching
Plasma
Field Ion Beam Scanning Electron Microscope
Materials Characterisation
Electron/Ion Microscopy
Scanning
Graphene Etch and Annealing
Process Equipment - Physical
Etching
Plasma
Heat Exchanger, System
Laser Flash Apparatus
Sample Measurement/Analysis
Laser
Characterisation
Laser Writer
Process Equipment - Physical
Lithography
Optical
Lathe
Infrastructure
Workshop
Lathe
Mask Aligner MJB4Part num100003863,G190173,G145984,G145987,G145988
Sample Measurement/Analysis
Laser
Characterisation
National Graphene Institute Stand-alone Water Purifiers
Infrastructure
Laboratory
Washing
Nikon DS series microscope cameras
Materials Characterisation
Imaging
Optical
Nikon Eclipse LV100ND upright microscope with episcopic & diascopic illumination and differential interference contrast
Materials Characterisation
Imaging
Optical
Nikon Eclipse LV100ND upright microscope with episcopic illumination
Materials Characterisation
Imaging
Optical
OBJET 260 Connex 2 Multi-material 3D Printer - 2 Year Education Package
Materials Characterisation
Imaging
Optical
Photospectrometer
Materials Characterisation
Spectrometry
Spectrophotometry
Raith ELPHY MultiBeam for Zeiss 540 Cross Beam
Process Equipment - Physical
Lithography
Electron beam
Spectroscopic Nulling Imaging Ellipsometer (Cleanroom Ellipsometer System)
Process Equipment - Physical
Characterisation
Ellipsometry
Superconducting 16T/18T Magnet
Sample Measurement/Analysis
High Magnetic Field
Superconducting Magnet
System for creating layered heterostructures form air sensitive 2D materials in argon environment
Process Equipment - Physical
Etching
Plasma
System for handling and encapsulating air sensitive 2D materials in argon environment
Process Equipment - Physical
Controlled Environment
Glove Box
Wafer Scribing Equipment
Process Equipment - Physical
Packaging
Dicing
Atomic Force Microscope 2 (AFM2)
Materials Characterisation
Surface Probe Microscopy
Atomic Force
Cooling system and chiller panel]
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