The Mask aligner is for UV lithography, a microfabrication process to selectively remove parts of a thin film of photoresist on a substrate. It uses UV light to transfer a geometric pattern from a photomask to a light-sensitive photoresist on the substrate. Sub-micron size features can be created after a series of chemical developments and thermal treatment. Our SUSS MJB3 has a mercury lamp which provides NUV spectrum ranging from 350 nm to 450 nm and can handle 2” wafers such as Si, GaAs semiconductor as well as other flat substrate.

ManufacturerKARL SUSS

ModelMJB 3



Academic Contact

Prof Prof Edmund Linfield

Technical Contact

Dr Dr Li Chen